Title :
Optimized CMP operation by extended X-factor theory including offline unit hour
Author :
Kishimoto, Mitsugu ; Ozawa, Katsutoshi
Author_Institution :
Semicond. Operations, Yasu IBM Japan Ltd., Shiga, Japan
Abstract :
We focus on operator efficiency in the CMP (chemical mechanical polishing) operation, which, as a typical manually operated tool, influences cycle time. The main purpose is to optimize CMP operation by using online/offline unit hour analysis and X-factor theory, and describe the relationship between operator headcount and cycle time. The online/offline unit hour analysis has been designed to optimize operator allocation and headcount in our production line in order to archive the shortest cycle time
Keywords :
chemical mechanical polishing; integrated circuit manufacture; process control; chemical mechanical polishing; cycle time; extended X-factor theory; offline unit hour; online/offline unit hour analysis; operator efficiency; operator headcount; optimized CMP operation; production line; Availability; Chemical analysis; Costs; Design optimization; Equations; Fabrication; Manufacturing; Production; Semiconductor device manufacture; Time to market;
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
0-7803-7392-8
DOI :
10.1109/ISSM.2000.993619
