An efficient treatment technique for TMAH wastewater by catalytic oxidation

Author

Hirano, K. ; Okamura, J. ; Taira, T. ; Sano, K. ; Toyoda, A. ; Ikeda, M.

Author_Institution

NEC Corp., Kawasaki, Japan

fYear

2000

fDate

2000

Firstpage

139

Lastpage

142

Abstract

We have developed a TMAH wastewater treatment technique that consists of a combination of two novel decomposition processes: pyrolyzing TMAH to TMA and decomposing TMA to N₂, CO₂ and H₂O by means of a selective catalytic oxidation for nitrogenous compounds. We have tested a system using this technique in long-term treatment of the actual wastewater and have found it to be sufficiently practical. The running cost of the treatment system using our technique would be about 1/9 the cost of disposing the wastewater as industrial waste, and about 2.3 times that of biological treatment. Compared with biological treatment, our system is tolerant to many treatment conditions, and operation management is much easier. Furthermore, our system occupies only about 1/6 the area of a biological treatment system

Keywords

catalysis; decomposition; environmental factors; organic compounds; oxidation; photolithography; pyrolysis; CO₂; H₂O; N₂; TMA; TMAH wastewater; decomposition; operation management; photolithography; pyrolysis; selective catalytic oxidation; tetramethylammoniumhydroxide; Costs; Industrial waste; Lithography; National electric code; Oxidation; Production facilities; System testing; Thermal decomposition; Thermal spraying; Wastewater treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on

Conference_Location

Tokyo

ISSN

1523-553X

Print_ISBN

0-7803-7392-8

Type

conf

DOI

10.1109/ISSM.2000.993634

Filename

993634