• DocumentCode
    2386584
  • Title

    Charging Damage and Product Impact in a Bulk CMOS Technology

  • Author

    Hook, Terence B. ; Musante, Charles ; Harmon, David ; Sullivan, Timothy

  • Author_Institution
    IBM Microelectron., Essex Junction, VT
  • fYear
    0
  • fDate
    0-0 0
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper, we tabulate the characteristics of antennas in several real designs in a 180-nm technology, and show data indicating that the product is not as susceptible to charging damage as the test structures used to control the process line. The experiment consisted of evaluating a large (500 pieces) sample of parts with considerable process-induced antenna damage - and yet no measurable degradation in product performance, yield, or reliability was found
  • Keywords
    antenna testing; nanotechnology; reliability; 180 nm; antenna characteristics; bulk CMOS technology; charging damage; nanotechnology; process line control; process-induced antenna damage; product impact; reliability; CMOS technology; Degradation; Diodes; Frequency; Hot carriers; Microelectronics; Process control; Testing; Threshold voltage; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Circuit Design and Technology, 2006. ICICDT '06. 2006 IEEE International Conference on
  • Conference_Location
    Padova
  • Print_ISBN
    1-4244-0097-X
  • Type

    conf

  • DOI
    10.1109/ICICDT.2006.220805
  • Filename
    1669392