Title :
Short cycle killer-particle control based on accurate in-line defect classification
Author :
Shimoda, Atsushi ; Watanabe, Kenji ; Takagi, Yuji ; Maeda, Shunji
Author_Institution :
Image Recognition & Inspection Syst. Dept, Hitachi Ltd., Yokohama, Japan
Abstract :
We present a systematic yield ramp-up method that can quickly screen "killer" particles associated with yield loss and pinpoint their entry point to the process. The proposed method uses automatic defect classification (ADC) to segregate killer particles. The practicality of this method is demonstrated by the results of experiments using actual production wafers. This method will make killer particle control more timely.
Keywords :
integrated circuit manufacture; integrated circuit yield; large scale integration; process control; LSI feature size; accurate in-line defect classification; automatic defect classification; killer particles segregation; production wafers; short cycle killer-particle control; systematic yield ramp-up method; yield loss; Equations; Etching; Image resolution; Inspection; Particle production; Pattern analysis; Performance evaluation; Production systems;
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Print_ISBN :
0-7803-7392-8
DOI :
10.1109/ISSM.2000.993648
