DocumentCode :
2387080
Title :
Modeling, identification and control of a metrological Atomic Force Microscope with a 3DOF stage
Author :
Merry, Roel ; Uyanik, Mustafa ; Koops, Richard ; van de Molengraft, Rene ; Van Veghel, Marijn ; Steinbuch, Maarten
Author_Institution :
Control Syst. Technol. group, Eindhoven Univ. of Technol., Eindhoven
fYear :
2008
fDate :
11-13 June 2008
Firstpage :
2716
Lastpage :
2721
Abstract :
Atomic Force Microscopes (AFMs) are widely used for the investigation of samples at nanometer scale. In this paper, we present the modeling, the identification and the control of a metrological AFM. The metrological AFM is used for the calibration of transfer standards for commercial AFMs. Therefore, the focus of the presented work is on scanning accuracy rather than on scanning speed. The contribution of this paper is the combination of 3 degree-of-freedom (DOF) control, including position feedforward, with an AFM with fixed cantilever and a piezo-stack driven stage. The amount of coupling between all DOFs is assessed by a non-parametric MIMO identification of the AFM. Since the dynamics appear to be decoupled in the frequency range of interest, feedback controllers are designed using loopshaping techniques for each DOF separately. Position feedforward is added to the stage in x and y direction, which improves the tracking performance by a factor two. The controlled stage is able to track scanning profiles within the sensor bound of 5 nm. With the proposed control method, the metrological AFM can produce images of the transfer standards with a sensor bound of 2 nm. Furthermore, real-time imaging of the sample is possible without the need for a-posteriori image correction. Finally, it is shown that the proposed control method almost completely compensates the hysteresis in the system.
Keywords :
MIMO systems; atomic force microscopy; feedforward; identification; position control; 3DOF stage; AFM; MIMO identification; a posteriori image correction; feedback controllers; fixed cantilever; loopshaping techniques; metrological atomic force microscope; piezo stack driven stage; position feedforward; Adaptive control; Atomic force microscopy; Calibration; Control systems; Focusing; Force control; Frequency; Hysteresis; Image sensors; MIMO;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
American Control Conference, 2008
Conference_Location :
Seattle, WA
ISSN :
0743-1619
Print_ISBN :
978-1-4244-2078-0
Electronic_ISBN :
0743-1619
Type :
conf
DOI :
10.1109/ACC.2008.4586903
Filename :
4586903
Link To Document :
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