Title :
Real-time dark field size measurement method for yield impact evaluation
Author :
Watanabe, Kenji ; Nishiyama, Hidetoshi ; Noguchi, Minori ; Fujiki, Daisuke ; Nemoto, Kazunori
Author_Institution :
Front-End Manuf. Technol. Dept., Hitachi Ltd., Ibaraki, Japan
Abstract :
A practical method for in-line particle size measurement called real-time dark field size measurement has been developed. Size measurement data possessing a good correlation coefficient (R2=0.7) by this method has been acquired using high-sensitivity dark field laser-scanning inspection tools. As a result, it is possible to evaluate yield impact properly even with high-sensitivity dark field laser-scanning inspection tools
Keywords :
inspection; large scale integration; measurement by laser beam; particle size measurement; correlation coefficient; high-sensitivity dark field laser-scanning inspection tools; in-line particle size measurement; real-time dark field size measurement method; yield impact evaluation; Data mining; Histograms; Image recognition; Inspection; Large scale integration; Manufacturing; Particle measurements; Silicon carbide; Size measurement; Time measurement;
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
0-7803-7392-8
DOI :
10.1109/ISSM.2000.993668
