DocumentCode
2387263
Title
Ultra clean process gas recycling system for plasma process using krypton and xenon
Author
Ohshima, Ichiro ; Ishihara, Yoshio ; Akutsu, Isao ; Ohmi, Tadahiro
Author_Institution
Dept. of Electron. Eng., Tohoku Univ., Sendai, Japan
fYear
2000
fDate
2000
Firstpage
305
Lastpage
308
Abstract
Introduction of rare Kr(Xe) gases into ULSI mass production requires the recycling of exhaust gases. We describe a gas pumping system that enables efficient recycling of Kr and Xe gases. A newly developed screw pump is able to exhaust without involving the atmosphere in its exhaust gases. Moreover, this screw pump needs a smaller volume of purge gases to realize clean pumping than conventional dry pumps. A novel bellows pump can compress recycle gases without involving the atmosphere. These pumping systems enable ultra clean process gas recycling system for the plasma process using krypton and xenon
Keywords
ULSI; krypton; recycling; sputter etching; vacuum pumps; xenon; Kr; ULSI mass production; Xe; bellows pump; clean pumping; gas pumping system; plasma process; purge gases; recycle gas compression; screw pump; ultra clean process gas recycling system; Atmosphere; Gases; Oxidation; Plasma applications; Plasma density; Plasma materials processing; Plasma sources; Plasma temperature; Recycling; Xenon;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
0-7803-7392-8
Type
conf
DOI
10.1109/ISSM.2000.993674
Filename
993674
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