• DocumentCode
    2387263
  • Title

    Ultra clean process gas recycling system for plasma process using krypton and xenon

  • Author

    Ohshima, Ichiro ; Ishihara, Yoshio ; Akutsu, Isao ; Ohmi, Tadahiro

  • Author_Institution
    Dept. of Electron. Eng., Tohoku Univ., Sendai, Japan
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    305
  • Lastpage
    308
  • Abstract
    Introduction of rare Kr(Xe) gases into ULSI mass production requires the recycling of exhaust gases. We describe a gas pumping system that enables efficient recycling of Kr and Xe gases. A newly developed screw pump is able to exhaust without involving the atmosphere in its exhaust gases. Moreover, this screw pump needs a smaller volume of purge gases to realize clean pumping than conventional dry pumps. A novel bellows pump can compress recycle gases without involving the atmosphere. These pumping systems enable ultra clean process gas recycling system for the plasma process using krypton and xenon
  • Keywords
    ULSI; krypton; recycling; sputter etching; vacuum pumps; xenon; Kr; ULSI mass production; Xe; bellows pump; clean pumping; gas pumping system; plasma process; purge gases; recycle gas compression; screw pump; ultra clean process gas recycling system; Atmosphere; Gases; Oxidation; Plasma applications; Plasma density; Plasma materials processing; Plasma sources; Plasma temperature; Recycling; Xenon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
  • Conference_Location
    Tokyo
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-7392-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2000.993674
  • Filename
    993674