DocumentCode :
2387316
Title :
1T MEMS Memory Based on Suspended Gate MOSFET
Author :
Abele, N. ; Villaret, A. ; Gangadharaiah, A. ; Gabioud, C. ; Ancey, P. ; Ionescu, A.M.
Author_Institution :
Lab. of Micro/Nanoelectronic Devices, Ecole Polytechnique Fed. e de Lausanne
fYear :
2006
fDate :
11-13 Dec. 2006
Firstpage :
1
Lastpage :
4
Abstract :
The design, operation, characterization and scalability of a 1T SG-MOSFET memory cell that combines a MOSFET solid-state device and a microelectromechanical gate electrode, is reported. The proposed SG-MOSFET memory uses the charging of the gate dielectric by direct contact of the conductive gate with the gate insulator during mechanical pull-in, which results in I-V hysteresis. Very low gate leakage and excellent current ratio in programmed logic states are demonstrated. Cycling without significant degradation up to 105 cycles is experimentally shown and the scalability of the cell is explored by simulation
Keywords :
MOSFET; leakage currents; micromechanical devices; random-access storage; semiconductor device models; MOSFET memory cell; gate dielectric; gate insulator; leakage current; microelectromechanical gate electrode; Dielectrics and electrical insulation; Electrodes; Gate leakage; Hysteresis; Leakage current; Logic devices; MOSFET circuits; Micromechanical devices; Scalability; Solid state circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2006. IEDM '06. International
Conference_Location :
San Francisco, CA
Print_ISBN :
1-4244-0439-8
Electronic_ISBN :
1-4244-0439-8
Type :
conf
DOI :
10.1109/IEDM.2006.346826
Filename :
4154245
Link To Document :
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