Title :
Statistical analysis and design of semiconductor manufacturing systems
Author :
Chen, Argon ; Guo, R.S. ; Lin, Puffy
Author_Institution :
Graduate Inst. of Indutrial Eng., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
The enormous complexity of a semiconductor manufacturing system is the main obstacle for making quality manufacturing control decisions. Conventional methodologies, such as queueing network and simulation analysis, are often too complex to be used effectively. In this paper, we will demonstrate a methodology to build simple statistical models that faithfully characterize the manufacturing system. We then show how these models can help improve the quality of manufacturing control decisions
Keywords :
integrated circuit design; integrated circuit manufacture; statistical process control; wafer-scale integration; manufacturing control decisions quality; semiconductor manufacturing systems design; statistical analysis; statistical process control; wafer fabrication; Analytical models; Control charts; Fabrication; Manufacturing processes; Manufacturing systems; Production facilities; Robustness; Semiconductor device manufacture; Statistical analysis; Virtual manufacturing;
Conference_Titel :
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
0-7803-7392-8
DOI :
10.1109/ISSM.2000.993681
