DocumentCode :
2387550
Title :
Gate-All-Around (GAA) Twin Silicon Nanowire MOSFET (TSNWFET) with 15 nm Length Gate and 4 nm Radius Nanowires
Author :
Yeo, Kyoung Hwan ; Suk, Sung Dae ; Li, Ming ; Yeoh, Yun-young ; Cho, Keun Hwi ; Hong, Ki-Ha ; Yun, SeongKyu ; Lee, Mong Sup ; Cho, Nammyun ; Lee, Kwanheum ; Hwang, Duhyun ; Park, Bokkyoung ; Kim, Dong-Won ; Park, Donggun ; Ryu, Byung-Il
Author_Institution :
Device Res. Team, Samsung Electron. Co., Yongin
fYear :
2006
fDate :
11-13 Dec. 2006
Firstpage :
1
Lastpage :
4
Abstract :
GAA TSNWFET with 15 nm gate length and 4 nm radius nanowires is demonstrated and shows excellent short channel immunity. p-TSNWFET shows high driving current of 1.94 mA/mum while n-TSNWFET shows on-current of 1.44 mA/mum. Merits of TSNWFET and performance enhancement of p-TSNWFET are explored using 3D and quantum simulation
Keywords :
MOSFET; nanowires; 15 nm; 4 nm; TSNWFET; performance enhancement; quantum simulation; short channel immunity; twin silicon nanowire MOSFET; Delay; Effective mass; Electronic equipment testing; Fabrication; Germanium silicon alloys; Immune system; MOSFET circuits; Nanoscale devices; Silicon germanium; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2006. IEDM '06. International
Conference_Location :
San Francisco, CA
Print_ISBN :
1-4244-0438-X
Electronic_ISBN :
1-4244-0439-8
Type :
conf
DOI :
10.1109/IEDM.2006.346838
Filename :
4154257
Link To Document :
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