DocumentCode
2387558
Title
Observation of Single Electron Tunneling and Ballistic Transport in Twin Silicon Nanowire MOSFETs (TSNWFETs) Fabricated by Top-Down CMOS Process
Author
Cho, Keun Hwi ; Suk, Sung Dae ; Yeoh, Yun Young ; Li, Ming ; Yeo, Kyoung Hwan ; Kim, Dong-Won ; Hwang, Sung Woo ; Park, Donggun ; Ryu, Byung-Il
Author_Institution
R&D Center, Samsung Electron. Co., Yongin
fYear
2006
fDate
11-13 Dec. 2006
Firstpage
1
Lastpage
4
Abstract
the authors report transport experiments on gate-all-around (GAA) TSNWFETs fabricated by top-down CMOS processes. The nanowire with 45 nm gate length exhibits single electron tunneling, and the total capacitance extracted from the measured data is in good agreement with the self-capacitance of an ideal cylinder. The nanowire with 125 nm gate length shows conductance quantization suggesting ballistic transport. The temperature dependence of the conductance steps is consistent with the crossover from classical to ballistic
Keywords
MOSFET; ballistic transport; nanowires; tunnelling; CMOS process; TSNWFET; ballistic transport; conductance quantization; single electron tunneling; twin silicon nanowire MOSFET; Ballistic transport; CMOS process; Capacitance measurement; Data mining; Electrons; Length measurement; MOSFETs; Quantization; Silicon; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2006. IEDM '06. International
Conference_Location
San Francisco, CA
Print_ISBN
1-4244-0438-X
Electronic_ISBN
1-4244-0439-8
Type
conf
DOI
10.1109/IEDM.2006.346839
Filename
4154258
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