Title :
Study of magnetron sputtering of vanadium oxide thin films
Author :
Wu, Z.M. ; Xie, G.Z. ; Mu, H. ; Wang, T. ; Xu, J.H. ; Huang, C.H. ; Jiang, Y.D.
Author_Institution :
Inst. of Microelectron. & Solid State Electron., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Abstract :
In this paper, the influence of different sputtering processes on square resistance of thin films has been discussed; the temperature coefficient of resistance (TCR) and the square resistance R□ of thin films were tested and analyzed. The proper technology parameter is found. At last, the composition of the films was analyzed by the XPS.
Keywords :
X-ray photoelectron spectra; electrical resistivity; sputtered coatings; vanadium compounds; VO; XPS; chemical composition; magnetron sputtering; square resistance; temperature coefficient of resistance; vanadium oxide thin film; Clamps; Electronic equipment testing; Fluid flow; Magnetic materials; Optical films; Optical sensors; Phase change materials; Sputtering; Substrates; Temperature control;
Conference_Titel :
Electrets, 2002. ISE 11. Proceedings. 11th International Symposium on
Print_ISBN :
0-7803-7560-2
DOI :
10.1109/ISE.2002.1043014
