DocumentCode
2387652
Title
Stable flow gas delivery system for low pressure liquefied gases
Author
Takagi, Hideki ; Ino, Minoru ; Tabata, Masahiro ; Nishikawa, Yukinobu
Author_Institution
Electron. Bus. Dev. Div., AIR LIQUIDE Japan Ltd., Ibaraki, Japan
fYear
2000
fDate
2000
Firstpage
387
Lastpage
390
Abstract
This paper describes the possibility to supply the low vapor pressure liquefied gas at stable pressure and relatively high flow rate by a system called all vapor phase gas delivery system, together with evaluation test results using WF6 and BCl3
Keywords
flowmeters; semiconductor device manufacture; BCl3; WF6; evaluation test results; low pressure liquefied gases; process gases; relatively high flow rate; semiconductor manufacture; stable flow gas delivery system; vapor phase gas delivery system; Control systems; Gas detectors; Gases; Heating; Pressure control; Sensor systems; System testing; Temperature control; Thermal sensors; Weight control;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
0-7803-7392-8
Type
conf
DOI
10.1109/ISSM.2000.993694
Filename
993694
Link To Document