• DocumentCode
    2387652
  • Title

    Stable flow gas delivery system for low pressure liquefied gases

  • Author

    Takagi, Hideki ; Ino, Minoru ; Tabata, Masahiro ; Nishikawa, Yukinobu

  • Author_Institution
    Electron. Bus. Dev. Div., AIR LIQUIDE Japan Ltd., Ibaraki, Japan
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    387
  • Lastpage
    390
  • Abstract
    This paper describes the possibility to supply the low vapor pressure liquefied gas at stable pressure and relatively high flow rate by a system called all vapor phase gas delivery system, together with evaluation test results using WF6 and BCl3
  • Keywords
    flowmeters; semiconductor device manufacture; BCl3; WF6; evaluation test results; low pressure liquefied gases; process gases; relatively high flow rate; semiconductor manufacture; stable flow gas delivery system; vapor phase gas delivery system; Control systems; Gas detectors; Gases; Heating; Pressure control; Sensor systems; System testing; Temperature control; Thermal sensors; Weight control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on
  • Conference_Location
    Tokyo
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-7392-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2000.993694
  • Filename
    993694