DocumentCode
2388320
Title
Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C)
fYear
2001
fDate
29-30 Nov. 2001
Abstract
Presents the front matter and table of contents for the conference proceedings.
Keywords
semiconductor junctions; CMOS technology; MOSFET; SIMS depth profiling; ion implantation; junction technology; laser annealing; rapid thermal processing; ultra-shallow junction;
fLanguage
English
Publisher
ieee
Conference_Titel
Junction Technology, 2001. IWJT. Extended Abstracts of the Second International Workshop on
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-019-4
Type
conf
DOI
10.1109/IWJT.2001.993812
Filename
993812
Link To Document