Title :
Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C)
Abstract :
Presents the front matter and table of contents for the conference proceedings.
Keywords :
semiconductor junctions; CMOS technology; MOSFET; SIMS depth profiling; ion implantation; junction technology; laser annealing; rapid thermal processing; ultra-shallow junction;
Conference_Titel :
Junction Technology, 2001. IWJT. Extended Abstracts of the Second International Workshop on
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-019-4
DOI :
10.1109/IWJT.2001.993812
