• DocumentCode
    2389207
  • Title

    Thermally Robust Multi-layer Non-Volatile Polymer Resistive Memory

  • Author

    Cho, Byeong-Ok ; Yasue, Takahiro ; Yoon, Hongsik ; Lee, Moon-Sook ; Yeo, In-Seok ; Chung, U-in ; Moon, Joo-Tae ; Ryu, Byung-Il

  • Author_Institution
    Semicond. R&D Div., Samsung Electron. Co. Ltd., Gyeonggi-Do
  • fYear
    2006
  • fDate
    11-13 Dec. 2006
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The feasibility of the charge-transfer based polymer resistive memory as a future data storage device was tested using a thermally robust polyimide and PCBM composite film, available by low-cost solution processing. The prototype device with a simple 4F cross-point cell structure demonstrated basic non-volatile memory functions (> 1000 write/erase cycles and 1-week data retention in an ambient without encapsulation). Not only bi-polar but also uni-polar operation scheme with multi-level programming worked for the device. The cells on both the top and the bottom layers of a stacked device with additional heat budget of > 300 degC for 1 hour exhibited no degradation on the performance
  • Keywords
    charge-coupled devices; multilayers; polymers; random-access storage; charge-transfer; composite film; data retention; data storage device; multilayer polymer resistive memory; multilevel programming; nonvolatile memory functions; nonvolatile polymer resistive memory; thermally robust polyimide; CMOS process; Electrodes; Electron traps; Nonvolatile memory; Polyimides; Polymer films; Robustness; Scalability; Thermal resistance; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2006. IEDM '06. International
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    1-4244-0438-X
  • Electronic_ISBN
    1-4244-0439-8
  • Type

    conf

  • DOI
    10.1109/IEDM.2006.346729
  • Filename
    4154330