Title :
Surface-charging behavior of plasma-treated polymer films
Author :
Künstler, W. ; Frübing, P. ; Gerhard-Multhaupt, R. ; Cerny, J. ; Klemberg-Sapieha, J. ; Martinu, L. ; Wertheimer, M.R. ; Holländer, A. ; Behnisch, J.
Author_Institution :
Dept. of Phys., Potsdam Univ., Germany
Abstract :
Thin films of the TeflonTM homo- and copolymers TFE, FEP, PFA, MFA, AF, and PVDF-TFE (VF2-VF4) were treated with a microwave plasma in hydrogen or argon, and charged with a point-to-grid corona. It was found that a hydrogen-plasma treatment has a greater influence on charge stability than an argon-plasma process and that the stability of plasma-treated and negatively charged fluoropolymers is lower than that of untreated samples, while the stability of plasma-treated and positively charged fluoropolymers is higher. X-ray photoelectron-spectroscopy showed ablation of fluorine and incorporation of oxygen- and nitrogen-containing groups into the surface. Furthermore, Teflon-PFA and polyethylene terephthalate (PETP) samples were charged in a radio-frequency argon plasma by way of self-biasing. In this case, the charge level increases with increasing bias and charging time. However, enhanced sample heating must be taken into account at higher plasma power. With a plasma, PFA can be charged to higher initial values, but PETP shows better charge stability
Keywords :
X-ray photoelectron spectra; corona; organic insulating materials; plasma materials processing; polymer films; surface charging; surface treatment; AF; FEP; MFA; PETP; PFA; PVDF-TFE; TFE; Teflon; X-ray photoelectron spectroscopy; ablation; charge stability; copolymer; fluoropolymer; homopolymer; microwave plasma treatment; point-to-grid corona; polyethylene terephthalate; polymer film; surface charging; Argon; Corona; Electromagnetic heating; Hydrogen; Plasma stability; Plasma x-ray sources; Polyethylene; Polymer films; Surface charging; Surface treatment;
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 1998. Annual Report. Conference on
Conference_Location :
Atlanta, GA
Print_ISBN :
0-7803-5035-9
DOI :
10.1109/CEIDP.1998.732971