DocumentCode :
2389735
Title :
Surface charging of silicon dioxide/silicon structures
Author :
Martin, B. ; Ostrovskiy, A. ; Kliem, H.
Author_Institution :
Inst. of Electr. Eng. Phys., Saarland Univ., Saarbrucken, Germany
fYear :
2011
fDate :
28-31 Aug. 2011
Firstpage :
41
Lastpage :
42
Abstract :
It has been shown that it is possible to charge the surface of SiO2 with a cantilever and to detect the resulting potential with the Kelvin option of an AFM. The surface charging with negative voltages is more effective than with positive voltages. The maximum of the potential depends on the charging voltage and the charging time. The surface potential shows a transient decay and a spread of the width w with relaxation times of about 30 h at room temperature. Due to the long time stability and the possibility to charge the surface in opposite direction an application as surface charge memory device is conceivable.
Keywords :
cantilevers; dielectric measurement; silicon compounds; surface charging; surface potential; Kelvin option; SiO2; cantilever; silicon dioxide; silicon structures; surface charge memory device; surface charging; Q measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrets (ISE), 2011 14th International Symposium on
Conference_Location :
Montpellier
ISSN :
2153-3253
Print_ISBN :
978-1-4577-1023-0
Type :
conf
DOI :
10.1109/ISE.2011.6084972
Filename :
6084972
Link To Document :
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