DocumentCode :
2390237
Title :
Floating Islands and Thick Bottom Oxide Trench Gate MOSFET (FITMOS) with Passive Hole Gate -60V Ultra Low On-Resistance Novel MOSFET-
Author :
Takaya, Hidefumi ; Miyagi, Kyosuke ; Hamada, Kimimori
Author_Institution :
Toyota Motor Corp., Aichi
fYear :
2006
fDate :
11-13 Dec. 2006
Firstpage :
1
Lastpage :
4
Abstract :
A MOSFET structure called a FITMOS has been successfully developed that exhibits record-low loss in the 60V breakdown voltage range (Kasakian and Perrault, 2001). The device has a body diode with superior reverse recovery characteristics and exhibits an extremely small value for RonQgd. The distinctive features of this device are the use of floating P islands formed by self-alignment and trench gates with a thick oxide layer at the bottom. However, during AC operation, the charges in the floating P islands become greater, increasing the on-resistance due to the JFET effect. This issue was solved by forming passive hole gates in the end walls of the trenches. The on-resistance under AC operation is equivalent to the on-resistance under DC operation
Keywords :
power MOSFET; semiconductor device breakdown; 60 V; FITMOS; JFET effect; body diode; floating islands; passive hole gate; self alignment; superior reverse recovery characteristics; trench gate MOSFET; trench gates; ultra low on-resistance MOSFET; Automobiles; Automotive engineering; Circuit simulation; Diodes; Immune system; MOSFET circuits; Power MOSFET; Power electronics; Space charge; Vehicles;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2006. IEDM '06. International
Conference_Location :
San Francisco, CA
Print_ISBN :
1-4244-0438-X
Electronic_ISBN :
1-4244-0439-8
Type :
conf
DOI :
10.1109/IEDM.2006.346934
Filename :
4154369
Link To Document :
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