DocumentCode :
2390253
Title :
Stress-induced MOSFET mismatch for analog circuits
Author :
Chen, Yuan ; Zhou, Jonathon ; Tedja, Suharli ; Hui, Frank ; Oates, Anthony S.
Author_Institution :
Technol. Reliability, Agere Syst., Orlando, FL, USA
fYear :
2001
fDate :
2001
Firstpage :
41
Lastpage :
43
Abstract :
This paper discusses the stress-induced mismatch for MOS transistors for analog circuits. Hot carrier aging and NBTI stress have been performed on nmos and pmos transistor pairs respectively to study transistor´s matching properties. While there is no evident increase of drain current mismatch for transistor pairs under the exactly same stress conditions, a slight difference in gate or drain voltage or in stress time will aggravate saturation current mismatch which is very critical to the analog circuits. The stress-induced transistor mismatch may be the limiting factor for the mismatch and therefore for the reliability of the analog circuits
Keywords :
MOSFET; MOSFET circuits; ageing; hot carriers; semiconductor device reliability; NBTI stress; NMOS transistor; PMOS transistor; analog circuit; drain current; hot carrier aging; reliability; saturation current; stress-induced MOSFET mismatch; Aging; Analog circuits; Degradation; Hot carriers; MOS devices; MOSFET circuits; Niobium compounds; Statistical distributions; Stress; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2001. 2001 IEEE International
Conference_Location :
Lake Tahoe, CA
Print_ISBN :
0-7803-7167-4
Type :
conf
DOI :
10.1109/.2001.993914
Filename :
993914
Link To Document :
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