Title :
Ultra-black nickel-phosphorus alloy optical absorber
Author :
Kodama, Shunichi ; Horiuchi, Masao ; Kuroda, Kenji ; Kunii, Toshihiro
Author_Institution :
Anritsu Corp., Kanagawa, Japan
Abstract :
In order to develop an optical absorber for use in the measurement of optical power, the authors investigated and evaluated ultra-black films of nickel-phosphorus alloy, which were plated and etched on substrates using an electroless plating process. The plating and etching bath components and conditions were examined. The spectral reflectances and surface morphologies of the films were measured precisely. An optical absorber with a spectral reflectance of about 0.1% to 0.2% and a low wavelength dependence in the wavelength range of 488 to 1550 nm has been developed. The absorber was exposed to two accelerated-aging environments: (a) 2000 hours in a dry (1% to 2% relative humidity) environment at 100°C, and (b) 2000 hours in a damp (85% relative humidity) environment at 85°C. After exposure (a), the spectral reflectance of the absorber increased slightly, but it retained an excellent level of 0.18% to 0.23% in the upper wavelength range. After exposure (b), the spectral reflectance and wavelength dependence showed almost no change
Keywords :
crystal morphology; light absorption; nickel alloys; optical films; optical variables measurement; phosphorus alloys; reflectivity; surface structure; 100 degC; 2000 hours; 488 to 1550 nm; 85 degC; Ni-P; accelerated-aging; dry environment; measurement of optical power; optical absorber; spectral reflectances; surface morphologies; ultra-black films; wavelength dependence; wet environment; Acceleration; Etching; Humidity; Nickel alloys; Optical films; Optical surface waves; Power measurement; Reflectivity; Surface morphology; Wavelength measurement;
Conference_Titel :
Instrumentation and Measurement Technology Conference, 1989. IMTC-89. Conference Record., 6th IEEE
Conference_Location :
Washington, DC
DOI :
10.1109/IMTC.1989.36909