• DocumentCode
    2390722
  • Title

    Thickness dependence of the Maxwell-Wagner-Sillars dielectric relaxation dynamics in semicrystalline fluorinated parylene

  • Author

    Bechara, M. ; Diaham, S. ; Locatelli, M.L.

  • fYear
    2011
  • fDate
    28-31 Aug. 2011
  • Firstpage
    131
  • Lastpage
    132
  • Abstract
    In summary, the effect of film thicknesses between 1.4 and 49.4 μm on the MWS relaxation in PA-F polymer films have been studied by broadband dielectric spectroscopy in wide temperature (20 οC to 400 οC) and frequency (100 mHz to 1 MHz) ranges. At the lowest frequencies, the variation of ε´ and tan<;5 with temperature shows the presence of the MWS relaxation. The results show a good correlation between the PA-F crystallinity increase (crystallite size growth as revealed by XRD results.) with increasing film thickness and the. shift of the MWS relaxation towards higher temperature and lower frequency.
  • Keywords
    X-ray diffraction; crystallisation; dielectric relaxation; polymer films; MWS relaxation; Maxwell-Wagner-Sillars dielectric relaxation dynamics; PA-F crystallinity; PA-F polymer films; XRD; broadband dielectric spectroscopy; crystallite size growth; film thickness dependence; frequency 100 mHz to 1 MHz; semicrystalline fluorinated parylene; size 1.4 mum to 49.4 mum; temperature 20 degC to 400 degC; Atmospheric measurements; Particle measurements; Thickness measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrets (ISE), 2011 14th International Symposium on
  • Conference_Location
    Montpellier
  • ISSN
    2153-3253
  • Print_ISBN
    978-1-4577-1023-0
  • Type

    conf

  • DOI
    10.1109/ISE.2011.6085017
  • Filename
    6085017