DocumentCode :
2390722
Title :
Thickness dependence of the Maxwell-Wagner-Sillars dielectric relaxation dynamics in semicrystalline fluorinated parylene
Author :
Bechara, M. ; Diaham, S. ; Locatelli, M.L.
fYear :
2011
fDate :
28-31 Aug. 2011
Firstpage :
131
Lastpage :
132
Abstract :
In summary, the effect of film thicknesses between 1.4 and 49.4 μm on the MWS relaxation in PA-F polymer films have been studied by broadband dielectric spectroscopy in wide temperature (20 οC to 400 οC) and frequency (100 mHz to 1 MHz) ranges. At the lowest frequencies, the variation of ε´ and tan<;5 with temperature shows the presence of the MWS relaxation. The results show a good correlation between the PA-F crystallinity increase (crystallite size growth as revealed by XRD results.) with increasing film thickness and the. shift of the MWS relaxation towards higher temperature and lower frequency.
Keywords :
X-ray diffraction; crystallisation; dielectric relaxation; polymer films; MWS relaxation; Maxwell-Wagner-Sillars dielectric relaxation dynamics; PA-F crystallinity; PA-F polymer films; XRD; broadband dielectric spectroscopy; crystallite size growth; film thickness dependence; frequency 100 mHz to 1 MHz; semicrystalline fluorinated parylene; size 1.4 mum to 49.4 mum; temperature 20 degC to 400 degC; Atmospheric measurements; Particle measurements; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrets (ISE), 2011 14th International Symposium on
Conference_Location :
Montpellier
ISSN :
2153-3253
Print_ISBN :
978-1-4577-1023-0
Type :
conf
DOI :
10.1109/ISE.2011.6085017
Filename :
6085017
Link To Document :
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