• DocumentCode
    2391170
  • Title

    Optimization of the collector profile of InGaP/GaAs HBTs for increased robustness

  • Author

    Pfost, M. ; Kubrak, V. ; Zwicknagl, P.

  • Author_Institution
    Infineon Technol. AG, Munich, Germany
  • fYear
    2003
  • fDate
    9-12 Nov. 2003
  • Firstpage
    115
  • Lastpage
    118
  • Abstract
    Heterojunction bipolar transistors are often used for power amplifiers, e.g. in GSM phones. Such applications require very robust devices that are able to withstand large voltages and currents. For this, an adequately chosen collector doping profile is a key parameter. In this work, we present a technique for optimizing the collector doping profile with respect to transistor robustness. The applicability of our approach is demonstrated experimentally by measurements of InGaP/GaAs HBTs, showing a significant increase of the safe operating area due to collector profile optimization.
  • Keywords
    III-V semiconductors; doping profiles; gallium compounds; heterojunction bipolar transistors; indium compounds; optimisation; power bipolar transistors; GSM phones; HBT robustness increase; InGaP-GaAs; collector doping profile optimization; heterojunction bipolar transistors; power amplifiers; safe operating area increase; Area measurement; Breakdown voltage; Current density; Doping profiles; Electrons; GSM; Gallium arsenide; Heterojunction bipolar transistors; Power amplifiers; Robustness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 2003. 25th Annual Technical Digest 2003. IEEE
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    1064-7775
  • Print_ISBN
    0-7803-7833-4
  • Type

    conf

  • DOI
    10.1109/GAAS.2003.1252376
  • Filename
    1252376