DocumentCode :
2391170
Title :
Optimization of the collector profile of InGaP/GaAs HBTs for increased robustness
Author :
Pfost, M. ; Kubrak, V. ; Zwicknagl, P.
Author_Institution :
Infineon Technol. AG, Munich, Germany
fYear :
2003
fDate :
9-12 Nov. 2003
Firstpage :
115
Lastpage :
118
Abstract :
Heterojunction bipolar transistors are often used for power amplifiers, e.g. in GSM phones. Such applications require very robust devices that are able to withstand large voltages and currents. For this, an adequately chosen collector doping profile is a key parameter. In this work, we present a technique for optimizing the collector doping profile with respect to transistor robustness. The applicability of our approach is demonstrated experimentally by measurements of InGaP/GaAs HBTs, showing a significant increase of the safe operating area due to collector profile optimization.
Keywords :
III-V semiconductors; doping profiles; gallium compounds; heterojunction bipolar transistors; indium compounds; optimisation; power bipolar transistors; GSM phones; HBT robustness increase; InGaP-GaAs; collector doping profile optimization; heterojunction bipolar transistors; power amplifiers; safe operating area increase; Area measurement; Breakdown voltage; Current density; Doping profiles; Electrons; GSM; Gallium arsenide; Heterojunction bipolar transistors; Power amplifiers; Robustness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 2003. 25th Annual Technical Digest 2003. IEEE
Conference_Location :
San Diego, CA, USA
ISSN :
1064-7775
Print_ISBN :
0-7803-7833-4
Type :
conf
DOI :
10.1109/GAAS.2003.1252376
Filename :
1252376
Link To Document :
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