DocumentCode
2391170
Title
Optimization of the collector profile of InGaP/GaAs HBTs for increased robustness
Author
Pfost, M. ; Kubrak, V. ; Zwicknagl, P.
Author_Institution
Infineon Technol. AG, Munich, Germany
fYear
2003
fDate
9-12 Nov. 2003
Firstpage
115
Lastpage
118
Abstract
Heterojunction bipolar transistors are often used for power amplifiers, e.g. in GSM phones. Such applications require very robust devices that are able to withstand large voltages and currents. For this, an adequately chosen collector doping profile is a key parameter. In this work, we present a technique for optimizing the collector doping profile with respect to transistor robustness. The applicability of our approach is demonstrated experimentally by measurements of InGaP/GaAs HBTs, showing a significant increase of the safe operating area due to collector profile optimization.
Keywords
III-V semiconductors; doping profiles; gallium compounds; heterojunction bipolar transistors; indium compounds; optimisation; power bipolar transistors; GSM phones; HBT robustness increase; InGaP-GaAs; collector doping profile optimization; heterojunction bipolar transistors; power amplifiers; safe operating area increase; Area measurement; Breakdown voltage; Current density; Doping profiles; Electrons; GSM; Gallium arsenide; Heterojunction bipolar transistors; Power amplifiers; Robustness;
fLanguage
English
Publisher
ieee
Conference_Titel
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 2003. 25th Annual Technical Digest 2003. IEEE
Conference_Location
San Diego, CA, USA
ISSN
1064-7775
Print_ISBN
0-7803-7833-4
Type
conf
DOI
10.1109/GAAS.2003.1252376
Filename
1252376
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