DocumentCode :
2391655
Title :
Fundamental Power and Frequency Limits of Deeply-Scaled CMOS for RF Power Applications
Author :
Scholvin, Jörg ; Greenberg, David R. ; del Alamo, Jesís A.
Author_Institution :
MIT, Cambridge, MA
fYear :
2006
fDate :
11-13 Dec. 2006
Firstpage :
1
Lastpage :
4
Abstract :
This study compares the RF power performance of 65 nm and 0.25 mum CMOS devices integrated on an advanced 65 nm process, and discusses their power and frequency limitations for the first time. The authors demonstrate output power levels of about 80 mW for 65 nm devices, and 450 mW for 0.25 mum devices when operated at their nominal voltages of 1.0 and 2.5 V respectively. The authors find that output power as well as the maximum frequency is limited by parasitic resistances in the backend. The results provide insight into the performance potential of RF power amplifiers integrated into advanced CMOS technologies in SoC applications
Keywords :
CMOS integrated circuits; MMIC power amplifiers; nanoelectronics; system-on-chip; 0.25 micron; 1.0 V; 2.5 V; 65 nm; RF power amplifiers; SoC applications; deeply-scaled CMOS; frequency limits; power limits; CMOS process; CMOS technology; Fingers; Frequency estimation; Power amplifiers; Power generation; Power measurement; Radio frequency; Radiofrequency amplifiers; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2006. IEDM '06. International
Conference_Location :
San Francisco, CA
Print_ISBN :
1-4244-0439-8
Electronic_ISBN :
1-4244-0439-8
Type :
conf
DOI :
10.1109/IEDM.2006.347001
Filename :
4154436
Link To Document :
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