DocumentCode :
2392423
Title :
MOSFET mobility degradation modelling
Author :
Babarada, F. ; Profirescu, M.D. ; Rusu, A.
Author_Institution :
Univ. "Politehnica" of Bucharest, Romania
Volume :
2
fYear :
2003
fDate :
28 Sept.-2 Oct. 2003
Abstract :
The design of linear analog circuits lacks models for state-of-the-art MOS transistors to accurately describe distortion effects. This is mainly due to inaccurate modelling of the mobility degradation effect i.e. the dependence of carrier mobility in the inversion layer on the normal electric (gate) field. A new mobility relation in agreement with experiment was obtained using quantum mechanical transport analysis.
Keywords :
MOSFET; carrier mobility; semiconductor device breakdown; semiconductor device models; MOSFET mobility degradation modelling; carrier mobility; distortion effects; inversion layer; linear analog circuits; mobility degradation effect; normal electric field; quantum mechanical transport analysis; Analog circuits; Carrier confinement; Charge carrier processes; Degradation; Doping; Light scattering; MOSFET circuits; Particle scattering; Quantum mechanics; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 2003. CAS 2003. International
Print_ISBN :
0-7803-7821-0
Type :
conf
DOI :
10.1109/SMICND.2003.1252440
Filename :
1252440
Link To Document :
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