DocumentCode
2392571
Title
Understanding the physical-chemical processes in a simulation tissue-implant interface
Author
Demetrescu, I. ; Popescu, B. ; Ionescu, D.
Author_Institution
Gen. Chem. Dept., Bucharest Univ., Romania
Volume
2
fYear
2003
fDate
28 Sept.-2 Oct. 2003
Abstract
A model of physical chemical processes at the tissue-implant interface is proposed in this paper, taking into account the double-layer theory, and the response of the material to the simulated host environment. The investigation methods were: potentiodynamic polarization, atomic absorption spectroscopy, X-ray photoelectron spectroscopy and IR spectra.
Keywords
X-ray photoelectron spectra; atomic absorption spectroscopy; biochemistry; infrared spectra; prosthetics; IR spectra; X-ray photoelectron spectroscopy; atomic absorption spectroscopy; double-layer theory; physical chemical processes; potentiodynamic polarization; simulation tissue-implant interface; Biological materials; Chemistry; Corrosion; Electric breakdown; Electrodes; Implants; Infrared spectra; Polarization; Spectroscopy; Titanium alloys;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 2003. CAS 2003. International
Print_ISBN
0-7803-7821-0
Type
conf
DOI
10.1109/SMICND.2003.1252448
Filename
1252448
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