• DocumentCode
    2394372
  • Title

    The performance and reliability enhancement of ETOX p-channel flash EEPROM cell with p-doped floating-gate

  • Author

    Tsai, H.W. ; Chiang, Patrick Yin ; Chung, S.S. ; Kuo, D.S. ; Liang, M.S.

  • Author_Institution
    Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • fYear
    2003
  • fDate
    6-8 Oct. 2003
  • Firstpage
    36
  • Lastpage
    39
  • Abstract
    In this paper, we proposed a simple approach for designing reliable and high performance p-channel Flash EEPROM cell from the floating-gate engineering point of view. In other words, a p-type doped floating gate used in a p-channel flash cell can achieve this goal. Results show that the programming speed, gate/drain disturb, read lifetime, and data retention in p-type floating-gate cell are much better than those of n-type floating-gate cell; except that p-type floating-gate cell has slower erasing speed. These results can be used as a guideline for designers to choose.
  • Keywords
    flash memories; integrated circuit reliability; n-type floating-gate cell; p-channel flash EEPROM cell; p-doped floating-gate; reliability; Design engineering; Dielectrics; Doping; EPROM; Flash memory; Flash memory cells; Nonvolatile memory; Reliability engineering; Testing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems, and Applications, 2003 International Symposium on
  • ISSN
    1524-766X
  • Print_ISBN
    0-7803-7765-6
  • Type

    conf

  • DOI
    10.1109/VTSA.2003.1252545
  • Filename
    1252545