Title :
Embedded dynamic random access memory
Author :
Kirihata, Toshiaki
Author_Institution :
IBM Semicond. Res. & Dev. Center, Hopewell Junction, NY, USA
Abstract :
For several decades, the 1-transistor Dynamic Random Access Memory (DRAM) has been the dominant choice for high density and low cost semiconductor memory in computing systems. Recently, advancements in miniaturization have allowed integration of DRAM on the same die with the processor. Key advancements in memory technology, architecture and circuit design required to capitalize on the merger of DRAM and logic are described here. After reviewing the history and accomplishments in embedded DRAM over the past decade, details of three generations of embedded DRAM development at IBM are discussed. In the third generation, which is the 130nm technology, three specialized DRAM macros have been developed. The first is a general purpose growable design targeted specifically for the ASIC´s environment. The second is an area optimized design which includes special features for reducing standby and data retention current. The third macro employs a novel destructive read architecture with a single-ended direct sensing scheme for enabling random cycle time as fast as 3.3ns for network applications.
Keywords :
DRAM chips; application specific integrated circuits; integrated circuit design; transistors; 130 nm; 3.3 ns; IBM; application-specific integrated circuit; circuit design; computing systems; embedded DRAM; embedded dynamic random access memory; enabling random cycle time; high density and low cost semiconductor memory; memory technology; single-ended direct sensing scheme; transistor dynamic random access memory; Circuit synthesis; Computer architecture; Corporate acquisitions; Costs; DRAM chips; Logic circuits; Logic design; Memory architecture; Random access memory; Semiconductor memory;
Conference_Titel :
VLSI Technology, Systems, and Applications, 2003 International Symposium on
Print_ISBN :
0-7803-7765-6
DOI :
10.1109/VTSA.2003.1252576