Title :
Highly Efficient Micromachined Bragg Mirrors Using Advanced DRIE Process
Author :
Saadany, B. ; Khalil, D. ; Bourouina, T.
Author_Institution :
ESIEE/Esycom-Lab., Noisy-le-Grand
Abstract :
A novel advanced deep reactive ion etching (DRIE) process technique is used to realize highly efficient vertical Bragg mirrors. The Bragg mirrors are realized by anisotropic etching of Si using DRIE, thus producing successive vertical interfaces between Si and air. The new etching technique is based on combining 2 steps of cryogenic and Bosch DRIE processes to obtain high quality Si walls in terms of both: high aspect ratio vertical walls as well as smooth surface. The realized Bragg mirrors, fabrication process, as well as measured optical performance showing the advantages of the new technique are presented
Keywords :
micromachining; micromirrors; silicon; sputter etching; Bosch DRIE processes; Si; Si walls; anisotropic etching; cryogenic DRIE processes; deep reactive ion etching process; high aspect ratio vertical walls; micromachined Bragg mirrors; vertical Bragg mirrors; Etching; High speed optical techniques; Micromechanical devices; Mirrors; Optical devices; Optical filters; Optical interferometry; Optical refraction; Optical sensors; Optical variables control; Bragg Mirrors; Cryogenic DRIE; DRIE;
Conference_Titel :
MEMS, NANO and Smart Systems, The 2006 International Conference on
Conference_Location :
Cairo
Print_ISBN :
1-4244-0899-7
DOI :
10.1109/ICMENS.2006.348215
