• DocumentCode
    2395663
  • Title

    Plasma Cathode For High Current Density Plasma Erosion Opening And Closing Switches

  • Author

    Elizondo, Juan M.

  • Author_Institution
    Tetra Corporation
  • fYear
    1991
  • fDate
    16-19 June 1991
  • Firstpage
    283
  • Lastpage
    285
  • Abstract
    We have constructed a plasma cathode that produces a uniformly diffuse discharge in vacuum (5 x 10/sup -5/ torr), with a current density of more than 60 A/cm/sup 2/. The plasma cathode consists of a number of plasma sources integrated to the electrode body, in such a way that when they are triggered the discharge volume is filled with a plasma that allows the transit of high current densities through the gap. Analysis of the preliminary test results shows a peak current density which is only limited by the conditions of the external circuit. The plasma cathode can be configured in a flat, radial or even a non-spherical geometry to focus the plasma ejected from each source. Voltage and current traces showing the behavior of the system are shown as well as the system set-up. Preliminary calculations show that the total current through the gap is not space-charge limited and that current conduction is through the bulk of the plasma. The device is ideal for plasma erosion opening switches or high current repetitive vacuum switches.
  • Keywords
    Cathodes; Circuit testing; Current density; Dielectrics; Driver circuits; Plasma density; Plasma devices; Plasma sources; Switches; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Pulsed Power Conference, 1991. Digest of Technical Papers. Eighth IEEE International
  • Conference_Location
    San Diego, CA, USA
  • Print_ISBN
    0-7803-0177-3
  • Type

    conf

  • DOI
    10.1109/PPC.1991.733286
  • Filename
    733286