DocumentCode :
2398443
Title :
Control chart techniques for high volume, multiple process wafer fabrication areas
Author :
Bassett, Tom, III
Author_Institution :
Signetics Corp., Sunnyvale, CA, USA
fYear :
1991
fDate :
21-23 Oct 1991
Firstpage :
132
Lastpage :
142
Abstract :
Control chart format and response to out-of-control conditions are examined. The main emphasis is on control charting pragmatism, simplicity, and cost effectiveness. Although several basic statistical tools are referenced, the control chart as a `current time, operation driven, historically succinct, online process control tool´, is the main focus. Control chart data log consolidation, z-normalization, fat targeting, sensor numbers, and symbolism are reviewed, with actual examples from the fabrication area to demonstrate design and modification of these simple, inexpensive, and powerfully effective statistical tools. Examples come from the traditional process parametrics, contamination control, product/inventory flow, and online statistical maintenance control applications
Keywords :
integrated circuit manufacture; production control; statistical process control; contamination control; control chart techniques; control charting pragmatism; cost effectiveness; data log consolidation; fat targeting; high volume wafer fabrication; inventory flow; multiple process wafer fabrication areas; online process control tool; online statistical maintenance control; out of control conditions response; product flow; sensor numbers; simplicity; statistical tools; symbolism; traditional process parametrics; z-normalization; Automatic control; CMOS technology; Contamination; Control charts; Costs; Fabrication; Heart; Process control; Production; Statistics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1991. ASMC 91 Proceedings. IEEE/SEMI 1991
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-0152-8
Type :
conf
DOI :
10.1109/ASMC.1991.167399
Filename :
167399
Link To Document :
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