SIMOX sculpting of 3-D nano-optical structures

Author

Koonath, Prakash ; Kishima, Koichiro ; Indukuri, Tejaswi ; Jalali, Bahram

Author_Institution

Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA

Volume

2

fYear

2003

fDate

27-28 Oct. 2003

Firstpage

588

Abstract

In this paper, fabrication of three dimensionally integrated nano-optical structures in silicon-on-insulator (SOI) substrates using the process of separation by implantation of oxygen (SIMOX) is reported. Buried rib waveguides with lowest ever loss with the SIMOX process, reported with the fabrication of vertically integrated structures using conventional lithography and etching process, demonstrate the capability to sculpt 3-D integrated optical devices.

Keywords

SIMOX; elemental semiconductors; etching; integrated optics; integrated optoelectronics; nanolithography; nanostructured materials; optical fabrication; optical losses; optical waveguides; rib waveguides; silicon; substrates; SIMOX; SOI; Si-SiO₂; etching; lithography; rib waveguide; separation by implantation of oxygen; silicon-on-insulator substrate; three dimensional integrated optical device; three dimensional nano-optical structure; vertically integrated structure fabrication; Annealing; Nanostructures; Optical device fabrication; Optical devices; Optical losses; Optical waveguides; Oxygen; Propagation losses; Silicon; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE

ISSN

1092-8081

Print_ISBN

0-7803-7888-1

Type

conf

DOI

10.1109/LEOS.2003.1252937

Filename

1252937