Control and compensation of birefringence in SOI waveguides

Author

Xu, D.-X. ; Cheben, P. ; Dalacu, D. ; Janz, Siegfried ; Picard, M.-J. ; Tarr, N.G. ; Ye, W.N.

Author_Institution

Inst. for Microstructural Sci., Nat. Res. Council of Canada, Ottawa, Ont., Canada

Volume

2

fYear

2003

fDate

27-28 Oct. 2003

Firstpage

590

Abstract

In this paper, the theoretical and experimental studies of SOI waveguide birefringence as controlled by cladding stress properties were reported. The experimental birefringence was obtained from array waveguide grating (AWG) demultiplexer Δλ measurements. A finite element simulator (FEMLAB), to analyse the stress and the corresponding birefringence in SOI ridge waveguides, was used.

Keywords

arrayed waveguide gratings; birefringence; demultiplexing equipment; finite element analysis; optical films; optical planar waveguides; optical variables measurement; photoelasticity; ridge waveguides; silicon-on-insulator; stress effects; Δλ measurement; AWG demultiplexer; SOI ridge waveguide birefringence; Si-SiO₂; array waveguide grating demultiplexer; cladding stress properties; finite element simulator; silicon-on-insulator waveguide birefringence; Arrayed waveguide gratings; Birefringence; Etching; Geometry; Optical polarization; Optical waveguides; Photoelasticity; Planar waveguides; Refractive index; Stress;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE

ISSN

1092-8081

Print_ISBN

0-7803-7888-1

Type

conf

DOI

10.1109/LEOS.2003.1252938

Filename

1252938