Title : 
Novel method to generate inspection care areas using GDS
         
        
            Author : 
Kang, HoSung ; Kim, MinHo ; Kim, KiHo ; SooCheol Lee ; Choi, JungA ; Pae, YeonHo ; Changho Lee ; Lee, Chris
         
        
            Author_Institution : 
Syst. LSI Div., Samsung Electron. Co., Ltd., Yongin, South Korea
         
        
        
        
        
        
            Abstract : 
In order to make wafer inspection more sensitive, it is necessary to create inspection care areas that better reflect the actual layout of features in each die. However, it is very time consuming and tedious to draw such care areas manually. In this work, we proposed a novel method to generate suitable care areas using GDS. Two innovative ways were developed and enabled this method to be implemented in a mass production.
         
        
            Keywords : 
inspection; microassembling; inspection care areas; mass production; wafer inspection; Data mining; Detection algorithms; Electronic design automation and methodology; Inspection; Large scale integration; Mass production; Metrology; Permission; Physics computing; Robustness;
         
        
        
        
            Conference_Titel : 
Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
         
        
            Conference_Location : 
Berlin
         
        
        
            Print_ISBN : 
978-1-4244-3614-9
         
        
            Electronic_ISBN : 
1078-8743
         
        
        
            DOI : 
10.1109/ASMC.2009.5155944