DocumentCode :
2400495
Title :
Design-for-manufacturing features in nanometer processes - A reverse engineering perspective
Author :
James, Dick
Author_Institution :
Chipworks Inc., Ottawa, ON, Canada
fYear :
2009
fDate :
10-12 May 2009
Firstpage :
56
Lastpage :
61
Abstract :
The first decade of the new millennium has seen the introduction of a suite of production disciplines known collectively as design for manufacturability (DFM). While there has been no formal definition of DFM, we can regard it broadly as the techniques used to co-optimise design, layout, and processing to reduce variability and improve manufacturing parameters, with the aim of increasing yield and reliability. Retrospectively, we can view design rule checking, and the dummy features used to improve CMP, as early forms of DFM.
Keywords :
design for manufacture; nanotechnology; reverse engineering; design-for-manufacturing; nanometer process; reverse engineering; Design for manufacture; Dielectrics; Manufacturing industries; Manufacturing processes; Metallization; Process design; Production; Reverse engineering; Semiconductor device manufacture; Semiconductor materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
Conference_Location :
Berlin
ISSN :
1078-8743
Print_ISBN :
978-1-4244-3614-9
Electronic_ISBN :
1078-8743
Type :
conf
DOI :
10.1109/ASMC.2009.5155953
Filename :
5155953
Link To Document :
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