Title :
Contamination induced risk reduction through improved control plan implementation
Author :
Maillot, P. ; Le Gall, M. ; Pic, N. ; Martin, C.
Author_Institution :
STMicroelectronics, Rousset, France
Abstract :
Background and details on an optimized control plan for metal contamination monitoring have been described. It must be emphasized that this control plan can only be defined and sustained through close interaction of R&D, Metrology, Process control and Production people.
Keywords :
contamination; control engineering computing; health and safety; process monitoring; semiconductor industry; statistical process control; R&D; metallic contamination; monitoring; optimized control plan; process control; production; risk reduction; Annealing; Degradation; Iron; Manufacturing processes; Monitoring; Pollution measurement; Risk management; Silicides; Silicon; Surface contamination;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
Conference_Location :
Berlin
Print_ISBN :
978-1-4244-3614-9
Electronic_ISBN :
1078-8743
DOI :
10.1109/ASMC.2009.5155975
