Title :
Novel SEM based imaging using secondary electron spectrometer for enhanced voltage contrast and bottom layer defect review
Author :
Avinun-Kalish, Michal ; Sagy, Omer ; Im, Seong Moon ; Lee, ChangHwan ; Oh, Jaehyoung ; Lim, Jungyeon ; Kim, ChulHong ; Yoo, HyungWon
Author_Institution :
Appl. Mater., Rehovot, Israel
Abstract :
The challenge of high quality SEM imaging of defects at the bottom of dense and high aspect ratio structures is addressed here. We present a method that leverages the natural voltage contrast developed along dense topographies, by amplifying the information from the bottom of dense structures, using a secondary electron spectrometric technique. This improves both the detection limits and the defect image quality helping to obtain the defect root cause.
Keywords :
flaw detection; scanning electron microscopy; secondary electron emission; aspect ratio; bottom layer; defects; dense topographies; enhanced voltage contrast; high quality SEM imaging; image quality; secondary electron spectrometer; Conducting materials; Electron beams; Electron emission; Image quality; Moon; Scattering; Semiconductor materials; Spectroscopy; Surface topography; Voltage;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
Conference_Location :
Berlin
Print_ISBN :
978-1-4244-3614-9
Electronic_ISBN :
1078-8743
DOI :
10.1109/ASMC.2009.5155988