Title :
Going green with on-site generated fluorine: Sustainable cleaning agent for CVD processes
Author :
Stockman, Paul ; Shuttleworth, Greg
Author_Institution :
Linde Electron., Murray Hill, NJ, USA
Abstract :
On-site generated fluorine meets the sustainability requirements for the future of CVD thin-film process chamber cleaning. Rigorous industry safety standards are maintained, GWP and total carbon footprint impacts are greatly reduced, and significant process improvements are available.
Keywords :
CVD coatings; fluorine; surface cleaning; CVD thin-film process chamber cleaning; F; GWP; industry safety standards; on-site generated fluorine; sustainable cleaning agent; total carbon footprint impacts; Costs; Extraterrestrial measurements; Fabrication; Green cleaning; Hafnium; Manufacturing industries; Manufacturing processes; Pollution measurement; Production; Throughput;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI
Conference_Location :
Berlin
Print_ISBN :
978-1-4244-3614-9
Electronic_ISBN :
1078-8743
DOI :
10.1109/ASMC.2009.5155996
