Title :
Reduction of optical insertion loss in traveling wave electroabsorption modulators by undercut-etching the active region
Author :
Cheng, Wen-Chin ; Chiu, Yi-Jen ; Bowers, John E.
Author_Institution :
Dept. of Opto-Electro Eng., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
Abstract :
In this paper, an improved traveling wave electroabsorption modulators (TWEAM) waveguides with selectively undercut the active region is proposed and fabricated. Optical transmission on wavelength shows that the undercut-active-layer waveguide (UAW) structure has advantage over the conventional ridge-waveguide (CRW) due to the lower propagation loss and the difference (about 2 to 3 dB) between the UAW structures and CRW structures indicates that the optical insertion loss of UAW type is about 2 to 3 dB lower than the CRW. This kind of structure has high potential for the application of high-speed and lower optical insertion-loss EAMs.
Keywords :
electroabsorption; etching; light propagation; light transmission; optical fabrication; optical loss measurement; optical losses; optical modulation; optical waveguides; 2 to 3 dB; conventional ridge-waveguide; optical fabrication; optical insertion loss reduction; optical transmission; propagation loss; traveling wave electroabsorption modulator waveguide; undercut-active-layer waveguide structure; undercut-etching; High speed optical techniques; Insertion loss; Optical computing; Optical devices; Optical fiber communication; Optical fiber losses; Optical losses; Optical modulation; Optical waveguides; Propagation losses;
Conference_Titel :
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
Print_ISBN :
0-7803-7888-1
DOI :
10.1109/LEOS.2003.1253161
