Title :
Field emitter arrays technologies and materials
Author :
Kleps, Irina ; Banoiu, Geta ; Avramescu, Viorel ; Angelescu, Anca
Author_Institution :
Inst. of Microtechnol., Bucharest, Romania
Abstract :
Silicon emitters arrays of various geometrical characteristics were realised using different micromachining technologies. The emitter geometry can be modified varying the technological parameters like: etch rate, selectivity and surface morphology. Silicon emitters were covered with various materials in order to improve their field emission properties
Keywords :
electron field emission; elemental semiconductors; etching; micromachining; silicon; vacuum microelectronics; Si; etching; field emission; micromachining; selectivity; silicon field emitter array; surface morphology; Dry etching; Field emitter arrays; Geometry; Micromachining; Plasma applications; Plasma density; Plasma devices; Silicon; Surface morphology; Wet etching;
Conference_Titel :
Semiconductor Conference, 1998. CAS '98 Proceedings. 1998 International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-4432-4
DOI :
10.1109/SMICND.1998.733764
