DocumentCode :
2404688
Title :
a-SiC(O,N):H thin films-their optical properties and possible applications
Author :
Seekamp, Jorg ; Bauhofer, Wolfgang
Author_Institution :
Arbeitsbereich Mater. der Mikroelektronik, Tech. Univ. Hamburg-Harburg, Germany
Volume :
2
fYear :
1998
fDate :
6-10 Oct 1998
Firstpage :
427
Abstract :
In this paper we summarize briefly the research on optical properties of a-Si1-xCx(O,N):H thin films and possible applications in devices and microsystems. Materials produced by different deposition processes are compared. Films grown from light hydrocarbons and monosilane on the one hand and films of polymerized organosilanes deposited in wet chemical on the other are described. These outer ends are set in relation to a third class of films made by plasma polymerization. These were deposited from liquid organosilanes avoiding hazardous conditions and starting materials. All three groups show promising photoluminescence and waveguiding properties, and these are discussed
Keywords :
integrated optics; liquid phase deposited coatings; optical films; optical waveguides; photoluminescence; plasma CVD coatings; silicon compounds; PECVD; SiC:O,N,H; a-SiC(O,N):H thin film; integrated optics; light hydrocarbon; liquid organosilane; monosilane; optical properties; optical waveguide; photoluminescence; plasma polymerization; polysilane; wet chemical synthesis; Chemical hazards; Hydrocarbons; Optical devices; Optical films; Optical materials; Optical polymers; Plasma chemistry; Plasma properties; Polymer films; Thin film devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 1998. CAS '98 Proceedings. 1998 International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-4432-4
Type :
conf
DOI :
10.1109/SMICND.1998.733773
Filename :
733773
Link To Document :
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