• DocumentCode
    2404688
  • Title

    a-SiC(O,N):H thin films-their optical properties and possible applications

  • Author

    Seekamp, Jorg ; Bauhofer, Wolfgang

  • Author_Institution
    Arbeitsbereich Mater. der Mikroelektronik, Tech. Univ. Hamburg-Harburg, Germany
  • Volume
    2
  • fYear
    1998
  • fDate
    6-10 Oct 1998
  • Firstpage
    427
  • Abstract
    In this paper we summarize briefly the research on optical properties of a-Si1-xCx(O,N):H thin films and possible applications in devices and microsystems. Materials produced by different deposition processes are compared. Films grown from light hydrocarbons and monosilane on the one hand and films of polymerized organosilanes deposited in wet chemical on the other are described. These outer ends are set in relation to a third class of films made by plasma polymerization. These were deposited from liquid organosilanes avoiding hazardous conditions and starting materials. All three groups show promising photoluminescence and waveguiding properties, and these are discussed
  • Keywords
    integrated optics; liquid phase deposited coatings; optical films; optical waveguides; photoluminescence; plasma CVD coatings; silicon compounds; PECVD; SiC:O,N,H; a-SiC(O,N):H thin film; integrated optics; light hydrocarbon; liquid organosilane; monosilane; optical properties; optical waveguide; photoluminescence; plasma polymerization; polysilane; wet chemical synthesis; Chemical hazards; Hydrocarbons; Optical devices; Optical films; Optical materials; Optical polymers; Plasma chemistry; Plasma properties; Polymer films; Thin film devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference, 1998. CAS '98 Proceedings. 1998 International
  • Conference_Location
    Sinaia
  • Print_ISBN
    0-7803-4432-4
  • Type

    conf

  • DOI
    10.1109/SMICND.1998.733773
  • Filename
    733773