DocumentCode :
2404782
Title :
Engineering of refractive index in sulfide chalcogenide glass by direct laser writing
Author :
Zhang, Yaping ; Gao, Yangqin ; Ng, Tien K. ; Ooi, Boon S. ; Chew, Basil ; Hedhili, Mohamed Nejib ; Zhao, Donghui ; Jain, Himanshu
Author_Institution :
Div. of Phys. Sci. & Eng., King Abdullah Univ. of Sci. & Technol. (KAUST), Thuwal, Saudi Arabia
fYear :
2010
fDate :
14-16 Dec. 2010
Firstpage :
1
Lastpage :
4
Abstract :
Arsenic trisulfide (As2S3) glass is an interesting material for photonic integrated circuits (PICs) as infrared (IR) or nonlinear optical components. In this paper, direct laser writing was applied to engineer the refractive index of As2S3 thin film. Film samples were exposed to focused above bandgap light with wavelength at 405 nm using different fluence adjusted by laser power and exposure time. The index of refraction before and after laser irradiation was calculated by fitting the experimental data obtained from Spectroscopic Ellipsometer (SE) measurement to Tauc-Lorenz dispersion formula. A positive change in refractive index (Δn = 0.19 at 1.55 μm) as well as an enhancement in anisotropy was achieved in As2S3 film by using 10 mW, 0.3 μs laser irradiation. With further increasing the fluence, refractive index increased while anisotropic property weakened. Due to the rapid and large photo-induced modification of refractive index obtainable with high spatial resolution, this process is promising for integrated optic device fabrication.
Keywords :
arsenic compounds; chalcogenide glasses; ellipsometers; integrated optics; laser materials processing; optical glass; refractive index; semiconductor thin films; As2S3; Tauc-Lorenz dispersion; anisotropy; bandgap light; chalcogenide glass; direct laser writing; exposure time; infrared optical components; integrated optic device fabrication; laser power; nonlinear optical components; photonic integrated circuits; power 10 mW; refractive index; spatial resolution; spectroscopic ellipsometer; time 0.3 mus; wavelength 1.55 mum; Glass; Optical device fabrication; Optical films; Optical refraction; Optical variables control; Refractive index;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics Global Conference (PGC), 2010
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-9882-6
Type :
conf
DOI :
10.1109/PGC.2010.5705967
Filename :
5705967
Link To Document :
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