Title :
The effect of track width and topography on composition uniformity of electroplated permalloy in thin film heads
Author :
Sahaml, S. ; Lee, H.P.
Author_Institution :
IBM Corporation
Keywords :
Current density; Dry etching; Electrons; Magnetic films; Magnetic heads; Poles and zeros; Sputter etching; Sputtering; Surfaces; Wet etching;
Conference_Titel :
Magnetics Conference, 1992. Digests of Intermag '92., International
Conference_Location :
St. Louis, MO, USA
Print_ISBN :
0-7803-0637-6
DOI :
10.1109/INTMAG.1992.696186
