DocumentCode :
2406404
Title :
Formation of ultra-thin SOI by dose-energy optimization
Author :
Chen, Meng ; Wang, Xiang ; Dong, Yeming ; Liu, Xianghua ; Yi, Wangbin ; Chen, Jing ; Wang, Xi
Author_Institution :
Shanghai Simgui Technol. Co. Ltd., China
fYear :
2002
fDate :
7-10 Oct 2002
Firstpage :
113
Lastpage :
114
Abstract :
We report our recent results on low/very low dose-energy combination implantation and its applications on patterned SOI and multi-BOX layer structures.
Keywords :
SIMOX; ion implantation; BOX layer; SIMOX wafers; dose-energy optimization; ion implantation; ultra-thin SOI; Ion implantation; SIMOX;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, IEEE International 2002
Print_ISBN :
0-7803-7439-8
Type :
conf
DOI :
10.1109/SOI.2002.1044441
Filename :
1044441
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2406404
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