Title :
Microstrip coupler circuits on micromachined silicon substrates for F-Band applications
Author :
Muller, A. ; Hasch, Jürgen ; Kasper, Erich
Author_Institution :
Robert Bosch GmbH, Ditzingen
Abstract :
Various microstrip coupler structures have been realized using high resistivity silicon on insulator (SOI) wafers. By applying an anisotropic etching process, membranes with a thickness of 50 mum are achieved. Thereby it is possible to realize low-loss microstrip circuits for millimeter-wave applications in F- band. This paper presents a side-coupled filter structure, a 10 dB directional coupler, a branch-line coupler, a rat-race coupler and a Wilkinson divider. The circuits are designed for the 122 GHz ISM band. The measured characteristics of the circuits agree well with the results achieved by momentum simulation.
Keywords :
etching; micromachining; microstrip circuits; microstrip couplers; millimetre wave circuits; millimetre wave couplers; silicon-on-insulator; F-band applications; SOI; Si-SiO2; Wilkinson divider; anisotropic etching process; branch-line coupler; directional coupler; frequency 122 GHz; high resistivity silicon on insulator wafers; micromachined silicon substrates; microstrip coupler circuits; millimeter-wave applications; momentum simulation; rat-race coupler; side-coupled filter structure; Anisotropic magnetoresistance; Biomembranes; Conductivity; Coupling circuits; Etching; Filters; Microstrip; Millimeter wave circuits; Millimeter wave measurements; Silicon on insulator technology;
Conference_Titel :
Microwave Conference, 2007. European
Conference_Location :
Munich
Print_ISBN :
978-2-87487-001-9
DOI :
10.1109/EUMC.2007.4405227
