DocumentCode :
2407786
Title :
Electrical & optical properties of Mg-doped narrow band-gap InSbN p-n junction
Author :
Chen, X.Z. ; Zhang, D.H. ; Jin, Y.J. ; Zhang, Sam
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ. of Singapore, Singapore, Singapore
fYear :
2010
fDate :
14-16 Dec. 2010
Firstpage :
1
Lastpage :
4
Abstract :
InSbN p-n junctions are fabricated by direct implantation of N+ and Mg+ into InSb wafers and their electrical and optical properties are characterized. It is found that high quality p-n junctions can be formed and they can absorb photons to form photocurrent. Furthermore, the peak and cut-off wavelengths absorbed can be controlled by monitoring the incorporated nitrogen and the measured peak wavelengths are consistent with the band gaps of the alloys calculated using a 10-band k·p model based on In-N bond.
Keywords :
III-V semiconductors; energy gap; indium compounds; ion implantation; k.p calculations; magnesium; narrow band gap semiconductors; p-n junctions; photoconductivity; photodiodes; 10-band k·p model; InSbN:Mg; band gap; cut-off wavelengths; direct implantation; electrical properties; narrow band-gap p-n junction; optical properties; peak wavelengths; photocurrent; photodiode; Current measurement; Metals; Nitrogen; P-n junctions; Photoconductivity; Photodiodes; Photonic band gap;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics Global Conference (PGC), 2010
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-9882-6
Type :
conf
DOI :
10.1109/PGC.2010.5706124
Filename :
5706124
Link To Document :
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