Title :
Modelling and characterisation of a VOA with different shutter thickness
Author :
Maaty, H. ; Bashir, A. ; Saadany, B. ; Khalil, D.
Author_Institution :
MEMScAP Egypt, Cairo, Egypt
Abstract :
In this work, we study the effect of the shutter thickness on the optical attenuation in an optomechanical variable optical attenuator. Both experimental and simulation results show a maximum in the received optical field with the shutter displacement, which increases at large shutter thickness. This behaviour has not been reported or analysed before
Keywords :
fast Fourier transforms; finite difference methods; micro-optics; modelling; optical communication equipment; optical elements; waveguide attenuators; wavelength division multiplexing; FFT-BPM; Gaussian beam; MEMS based shutter; WDM systems; attenuation curve; gain equalization; knife-edge shutter; linearity; modelling; optomechanical variable optical attenuator; received optical field; sensitivity; shutter displacement; shutter thickness effect; Insertion loss; Micromechanical devices; Optical attenuators; Optical fiber devices; Optical fiber polarization; Optical interferometry; Optical refraction; Optical saturation; Optical variables control; Stimulated emission;
Conference_Titel :
Photonics and Its Application at Egyptian Engineering Faculties and Institutes, 2002. Third Workshop on
Conference_Location :
Giza
Print_ISBN :
0-7803-7163-1
DOI :
10.1109/PAIA.2002.995084
