Title :
Integrated Cu-based TM-pass polarizer using CMOS technology platform
Author :
Tien, K.N. ; Zahed, M.K. ; Boon, S.O.
Author_Institution :
Div. of Phys. Sci. & Eng., King Abdullah Univ. of Sci. & Technol. (KAUST), Thuwal, Saudi Arabia
Abstract :
A transverse-magnetic-pass (TM-pass) copper (Cu) polarizer is proposed and analyzed using the previously published two-dimensional Method-of-Lines beam-propagation model. The proposed polarizer exhibits a simulated high-pass filter characteristics, with TM0 and TE0 mode transmissivity of >;70% and <;5%, respectively, in the wavelength regime of 1.2-1.6 μm. The polarization extinction ratio (PER) given by 10 log10 (PTM0)/(PTE0) is +11.5 dB across the high-pass wavelength regime. To the best of the authors´ knowledge, we report here the smallest footprint CMOS-platform compatible TM-polarizer.
Keywords :
CMOS integrated circuits; copper; elemental semiconductors; integrated optics; light polarisation; method of lines; optical filters; optical polarisers; semiconductor-metal boundaries; silicon; CMOS technology; Si-Cu-Si; TE0 mode transmissivity; TM0 mode transmissivity; polarization extinction ratio; transverse-magnetic-pass copper polarizer; two-dimensional method-of-lines beam-propagation model; Copper; Integrated optics; Optical filters; Optical imaging; Optical polarization; Optical sensors; Optical waveguides;
Conference_Titel :
Photonics Global Conference (PGC), 2010
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-9882-6
DOI :
10.1109/PGC.2010.5706134
