DocumentCode :
2408516
Title :
Secondary ion mass spectrometry analysis of wafer contamination resulting from gloved hands
Author :
Morinville, Wendy ; Krasinski, Chantelle
Author_Institution :
Surface Anal. Lab., Micron Technol., Inc., Boise, ID
fYear :
0
fDate :
0-0 0
Lastpage :
36
Abstract :
It is well known that wafer-handling protocols to avoid contamination are a mandatory part of semiconductor fabrication. One of the most important pieces of the standard "cleanroom" suit is the glove worn to eliminate contamination from human skin, of which mobile ions from fingerprint oils are a major contributor. This paper shows that wafer handling, even with fabrication-recommended gloves in place, can still significantly contaminate the wafer
Keywords :
clean rooms; materials handling; secondary ion mass spectroscopy; semiconductor device manufacture; surface contamination; cleanroom suit; fingerprint oils; gloved hands; human skin; mobile ions; secondary ion mass spectrometry analysis; semiconductor fabrication; wafer contamination; wafer-handling protocols; Chemical analysis; Chemical elements; Fingerprint recognition; Humans; Ion beams; Mass spectroscopy; Oils; Silicon; Skin; Surface contamination;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics and Electron Devices, 2006. WMED '06. 2006 IEEE Workshop on
Conference_Location :
Boise, ID
Print_ISBN :
1-4244-0374-X
Type :
conf
DOI :
10.1109/WMED.2006.1678296
Filename :
1678296
Link To Document :
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