DocumentCode
2410990
Title
A compact X-ray lithography lattice using superferric magnets
Author
Swenson, Charles A. ; Huson, F.R. ; MacKay, W.W. ; Chen, L.K. ; Ohnuma, S.
Author_Institution
Texas Accel. Center, The Woodlands, TX, USA
fYear
1989
fDate
20-23 Mar 1989
Firstpage
1242
Abstract
A conceptual lattice design for a very compact superconducting synchrotron dedicated to X-ray lithography is presented. The synchrotron radiation produced in the high field superconducting magnets has a critical wavelength of 10 Å at a beam energy of about 787 MeV. The size and angular divergence of the beam in this lattice can satisfy the future requirements for X-ray lithography: σx,y⩽1 mm and σx,y⩽1 mr. An optimization of these two lithography parameters for this lattice configuration is presented. The design philosophy advocated is as follows: (1) simplify the light source dipole magnet design by removing the radial field gradient; (2) select the largest dipole field strengths where ferric magnets can be constructed efficiently; (3) determine the minimal lattice configuration where the optical source properties for lithography can be satisfied; and (4) design a compact intermediate energy injection system to avoid the problems associated with low-energy injection
Keywords
electron accelerators; electron beam lithography; synchrotrons; 10 Å; 787 MeV; X-ray lithography; dipole magnet; intermediate energy injection system; lattice design; superconducting synchrotron; superferric magnets; synchrotron radiation; Land mobile radio; Lattices; Light sources; Machinery production industries; Magnetic fields; Magnets; Optical design; Physics; Synchrotron radiation; X-ray lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 1989. Accelerator Science and Technology., Proceedings of the 1989 IEEE
Conference_Location
Chicago, IL
Type
conf
DOI
10.1109/PAC.1989.73409
Filename
73409
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