DocumentCode
2411576
Title
Requirement of effective fabless/foundry interactions for achieving robust product reliability
Author
Kalpat, Sriram ; Mogul, Homyar ; Hau-Riege, Christine ; Hnatek, Eugene R. ; Liu, Jonathan H. ; Yau, You-Wen
fYear
2010
fDate
17-21 Oct. 2010
Firstpage
22
Lastpage
22
Abstract
It is no longer sufficient for foundries to provide only process technology qualification data (for example, device hot carrier, TDDB, BTI, interconnect EM, SM etc.) to the fabless companies as it has been done traditionally. At the nanometer scale, process variations (die to die & within die) coupled with shrinking reliability margins have significantly reduced the design space while circuit designs become increasingly complicated. Foundries need to provide detailed reliability information to enable process-variability & reliability-aware designs that allow the fabless users to leverage the benefits of the advanced technologies. The information is needed for all users and is critical to be available in the process development phase for early technology adaptors. Information should include detailed reliability design rules/tools in form of device/interconnect degradation models that incorporate statistical/process variations. These models/tools can help designers to identify and to mitigate circuit reliability risks in the early design phase. This paper addresses this shift of paradigm that allows fabless designs to keep pace with the rapidly changing nano scale technologies.
Keywords
design for manufacture; foundries; integrated circuit design; integrated circuit interconnections; integrated circuit manufacture; integrated circuit modelling; integrated circuit reliability; statistical analysis; circuit designs; circuit reliability risks; design space; detailed reliability information; device degradation models; early technology adaptors; fabless company; fabless designs; fabless interactions; foundry interactions; interconnect degradation models; nano scale technology; nanometer scale; process development phase; process technology qualification data; process variations; process-variability; reliability-aware designs; robust product reliability; shrinking reliability margins; statistical variations;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report (IRW), 2010 IEEE International
Conference_Location
Stanford Sierra, CA
ISSN
1930-8841
Print_ISBN
978-1-4244-8521-5
Type
conf
DOI
10.1109/IIRW.2010.5706476
Filename
5706476
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